本人自己常用的光刻参数，作为备份也希望对感兴趣者有帮助。

1. Spin coating

1) Tokyo ouka kougyou OAP (1.1.1.3.3.3 Hexamethyldisilazane)

Slope 5s; 200 rpm, 5s; slope 5s; 4000 rpm, 10s; slope 5s; end

2) AZ5214E

Slope 5s; 200 rpm, 10s; slope 10s; 2000 rpm, 60s; slope 5s; end

2. Baking at 90 ^oC, 180 s

3. Exposure with mask (Hard mode) for 1 s

4. Baking at 120 ^oC for 90 s

5. Dipping in water for 30 s

6. Exposure without mask (Flood – E mode) for 20 s

7. Develop

1) Tokyo ouka kougyou NMD-3 (tetramethyl ammonium hydroxide 2.38 % aq.) for 120 s

2) Water rinsing for 30 s, 3 times

8. Baking at 120 ^oC, 120 s

转载本文请联系原作者获取授权，同时请注明本文来自王安邦科学网博客。
链接地址：https://blog.sciencenet.cn/blog-41259-443056.html

上一篇：相见欢 贺湘明老师博园两周岁
下一篇：招博士后(日本国立材料研究所Yoshio Bando教授组)