|
2019年,东京电子株式会社(TOKYO ELECTRON LIMITED,主营半导体制造设备)获得韩国发明专利282项,比上一年增长了-27%,是获得韩国专利授权数量第36多的机构。
相对来讲,东京电子株式会社专利研发的优势领域是:半导体制造、电热与等离子体、电气元件和结构部件、材料化学与纳米、半导体组件与集成电路。在这5个技术领域上,东京电子株式会社的专利份额相对较高,分别占同领域韩国专利数量的5%到0%。
从绝对数量上来看,东京电子株式会社的重点技术领域是:半导体制造、电气元件和结构部件、电热与等离子体、材料化学与纳米、半导体元件。在这5个领域上获得了数量最多的韩国专利,为243至22项。
可见,东京电子株式会社的专利技术研发主要集中在半导体制造领域。
表46.36-1 2019年东京电子株式会社主要技术领域的专利分布
技术领域 | 专利数量 | 占比(%) | |
1 | 半导体制造 | 243 | 5.3% |
2 | 电热与等离子体 | 37 | 1.1% |
3 | 电气元件和结构部件 | 47 | 0.8% |
4 | 材料化学与纳米 | 27 | 0.5% |
5 | 半导体组件与集成电路 | 10 | 0.4% |
6 | 半导体元件 | 22 | 0.4% |
7 | 半导体零配件 | 3 | 0.3% |
8 | 光学和摄影 | 12 | 0.2% |
9 | 分离和混合加工作业 | 12 | 0.2% |
10 | 控制器和运算器CPU | 1 | 0.1% |
11 | 计算机安全 | 1 | 0.1% |
12 | 基本电子电路 | 1 | 0.1% |
13 | 材料测试 | 3 | 0.1% |
14 | 光电辐射测量与核物理 | 3 | 0.1% |
15 | 物理信号和控制 | 3 | 0.1% |
16 | 包装和储运 | 3 | 0.1% |
17 | 计算机一般零部件 | 1 | 0.1% |
18 | 成型加工作业 | 5 | 0.0% |
19 | 计算机应用与软件工程 | 1 | 0.0% |
20 | 一般机械和武器 | 2 | 0.0% |
注:专利数据按照第一申请人进行统计,占比(%)指其在某领域上的专利数量占该领域的比例。
图46.36-1 2019年东京电子株式会社在20个相对优势领域中的专利占比
感谢大连理工大学刘则渊教授、河南师范大学梁立明教授、科技部中国科学技术发展战略研究院武夷山研究员对本报告的支持、帮助、建议和意见。同时也感谢对本报告做出贡献的一些审阅者和讨论者,包括武汉大学张琳教授、武汉大学黄颖副教授等学者。
表46.36-2 2019年东京电子株式会社的韩国专利(按第一申请人统计)
序号 | 专利号 | 专利标题 |
1 | 101937727 | ETCHING METHOD |
2 | 101938441 | METHOD FOR FORMING A SEMICONDUCTOR DEVICE |
3 | 101938905 | METHOD OF SLIMMING RADIATION-SENSITIVE MATERIAL LINES IN LITHOGRAPHIC APPLICATIONS |
4 | 101939161 | PLATING METHOD, PLATING SYSTEM AND STORAGE MEDIUM |
5 | 101939166 | SUBSTRATE PROCESSING SCRUBBER, SUBSTRATE PROCESSING APPARATUS AND SUBSTRATE PROCESSING METHOD |
6 | 101940603 | SUBSTRATE PROCESSING METHOD, SUBSTRATE PROCESSING DEVICE, AND STORAGE MEDIUM |
7 | 101941766 | SUBSTRATE PROCESSING METHOD AND RECORDING MEDIUM |
8 | 101942447 | SUBSTRATE PROCESSING METHOD, STORAGE MEIDUM STORING COMPUTER PROGRAM FOR IMPLEMENTING SUBSTRATE PROCESSING METHOD AND SUBSTRATE PROCESSING APPARATUS |
9 | 101942587 | LIQUID PROCESSING APPARATUS |
10 | 101942613 | PROCESSING APPARATUS AND PROCESSING METHOD |
11 | 101943181 | SUBSTRATE TEMPERATURE CONTROL APPARATUS AND SUBSTRATE PROCESSING APPARATUS |
12 | 101943691 | FILM FORMING APPARATUS AND SHOWER HEAD |
13 | 101943693 | SUBSTRATE PROCESSING APPARATUS |
14 | 101943754 | MICROWAVE PLASMA SOURCE AND MICROWAVE PLASMA PROCESSING APPARATUS |
15 | 101944202 | SUBSTRATE TRANSPORTATION METHOD AND PROCESSING SYSTEM |
16 | 101945566 | TREATMENT LIQUID SUPPLY DEVICE, TREATMENT LIQUID SUPPLY METHOD AND COMPUTER STORAGE MEDIUM |
17 | 101945592 | MAGNETIZING APPARATUS AND MAGNETIZING METHOD |
18 | 101945609 | SUBSTRATE PROCESSING METHOD FOR SELECTIVE FILM FORMATION FOR RAISED AND RECESSED FEATURES USING DEPOSITION AND ETCHING PROCESSES |
19 | 101946094 | TEMPERATURE CONTROL DEVICE, PROCESSING DEVICE, AND TEMPERATURE CONTROL METHOD |
20 | 101946124 | LOWER ELECTRODE OF DRAM CAPACITOR AND MANUFACTURING METHOD THEREOF |
21 | 101946144 | SUBSTRATE PROCESSING METHOD |
22 | 101947212 | DRIVE DEVICE AND SUBSTRATE PROCESSING SYSTEM |
23 | 101949722 | SUBSTRATE PROCESSING APPARATUS, SUBSTRATE PROCESSING METHOD AND STORAGE MEDIUM |
24 | 101950548 | MULTI-LAYER FILM ETCHING METHOD AND PLASMA PROCESSING APPARATUS |
25 | 101950565 | METHOD AND APPARATUS FOR INCREASED RECIRCULATION AND FILTRATION IN A PHOTORESIST DISPENSE SYSTEM |
26 | 101951054 | METHOD FOR REFERENCE IMAGE GENERATING ON SUBSTRATE, METHOD FOR INSPECTION OF DEFECTS ON SUBSTRATE, APPARATUS FOR REFERENCE IMAGE GENERATING ON SUBSTRATE, UNIT FOR INSPECTION OF DEFECTS ON SUBSTRATE AND COMPUTER-READABLE RECORDING MEDIUM |
27 | 101952444 | FLOATING SUBSTRATE COATING APPARATUS |
28 | 101953423 | PRODUCTION EFFICIENCY IMPROVEMENT SYSTEM, PRODUCTION EFFICIENCY IMPROVEMENT DEVICE AND PRODUCTION EFFICIENCY IMPROVEMENT METHOD |
29 | 101953464 | INSPECTION APPARATUS, INSPECTION METHOD, AND FUNCTIONAL LIQUID DROPLET EJECTION APPARATUS |
30 | 101953934 | JOINING METHOD AND JOINING SYSTEM |
31 | 101954475 | PRODUCTION PROCESSING SYSTEM, CONTROL DEVICE FOR PRODUCTION PROCESSING, METHOD FOR CONTROLLING PRODUCTION PROCESSING AND CONTROL PROGRAM FOR PRODUCTION PROCESSING |
32 | 101955062 | SEMICONDUCTOR DEVICE, SEMICONDUCTOR DEVICE MANUFACTURING METHOD, AND SEMICONDUCTOR MANUFACTURING APPARATUS |
33 | 101956478 | ANTENNA UNIT FOR INDUCTIVELY COUPLED PLASMA, INDUCTIVELY COUPLED PLASMA PROCESSING APPARATUS AND METHOD THEREFOR |
34 | 101956740 | DRYING APPARATUS AND DRYING METHOD |
35 | 101957348 | PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD |
36 | 101957911 | PLASMA PROCESSING APPARATUS |
37 | 101959108 | FILM-FORMING METHOD, COMPUTER STORAGE MEDIUM, AND FILM-FORMING SYSTEM |
38 | 101959183 | METHOD OF DEPOSITING DIELECTRIC FILMS USING MICROWAVE PLASMA |
39 | 101960112 | ADAPTIVE RECIPE SELECTOR |
40 | 101960120 | PRETREATMENT METHOD AND CARBON NANOTUBE FORMATION METHOD |
41 | 101961988 | SUBSTRATE PROCESSING APPARATUS, METHOD FOR DETECTING VERTICAL POSITION OF LIFT PIN, METHOD FOR ADJUSTING VERTICAL POSITION OF LIFT PIN, AND METHOD FOR DETECTING ABNORMALITY OF LIFT PIN |
42 | 101963954 | TRANSFORMER, PLASMA PROCESSING APPARATUS, AND PLASMA PROCESSING METHOD |
43 | 101965455 | SUBSTRATE PROCESSING APPARATUS AND SUBSTRATE PROCESSING METHOD |
44 | 101965957 | METHOD FOR FORMING COPPER FILM |
45 | 101967490 | ION ENERGY ANALYZER, METHODS OF ELECTRICAL SIGNALING THEREIN, AND METHODS OF MANUFACTURING AND OPERATING THE SAME |
46 | 101967503 | SUBSTRATE TREATMENT METHOD, COMPUTER STORAGE MEDIUM, AND SUBSTRATE TREATMENT SYSTEM |
47 | 101967940 | SUBSTRATE TRANSFERRING APPARATUS FOR SUBSTRATE PROCESSING SYSTEM |
48 | 101968800 | HEAT TREATMENT APPARATUS |
49 | 101969599 | SUBSTRATE PROCESSING APPARATUS, ADJUSTMENT METHOD AND STORAGE MEDIUM |
50 | 101969611 | PLASMA PROCESSING APPARATUS |
51 | 101970362 | RADIO FREQUENCY POWER COUPLING SYSTEM UTILIZING MULTIPLE RF POWER COUPLING ELEMENTS FOR CONTROL OF PLASMA PROPERTIES |
52 | 101970844 | LIQUID PROCESSING APPARATUS |
53 | 101971098 | SUBSTRATE CLEANING DEVICE, SUBSTRATE CLEANING SYSTEM, SUBSTRATE CLEANING METHOD AND STORAGE MEDIUM |
54 | 101971773 | SUBSTRATE PROCESSING APPARATUS |
55 | 101972148 | ORGANIC DEVICE MANUFACTURING METHOD AND ORGANIC DEVICE MANUFACTURING APPARATUS |
56 | 101973016 | DRYING APPARATUS AND DRYING METHOD |
57 | 101973216 | LIQUID PROCESSING APPARATUS, LIQUID PROCESSING METHOD AND STORAGE MEDIUM FOR LIQUID PROCESSING |
58 | 101973233 | ELECTRONIC DEVICE, MANUFACTURING METHOD THEREOF, MANUFACTURING APPARATUS THEREOF |
59 | 101973234 | SUBSTRATE TRANSFER SYSTEM AND HEAT TREATMENT APPARATUS USING SAME |
60 | 101974267 | PLASMA PROCESSING APPARATUS |
61 | 101974268 | PLASMA PROCESSING APPARATUS |
62 | 101974663 | SUBSTRATE PROCESSING APPARATUS AND SUBSTRATE PROCESSING METHOD |
63 | 101974691 | PLASMA PROCESSING APPARATUS |
64 | 101974715 | OXIDE FILM REMOVING METHOD, OXIDE FILM REMOVING APPARATUS, CONTACT FORMING METHOD, AND CONTACT FORMING SYSTEM |
65 | 101976261 | METHODS FOR ADDITIVE FORMATION OF A STT MRAM STACK |
66 | 101976860 | COATING APPARATUS, COATING METHOD, AND COMPUTER-READABLE STORAGE MEDIUM |
67 | 101977120 | METHOD FOR PREFERENTIAL OXIDATION OF SILICON IN SUBSTRATES CONTAINING SILICON AND GERMANIUM |
68 | 101977320 | PLASMA PROCESSING APPARATUS |
69 | 101977460 | TUNGSTEN FILM FORMING METHOD AND STORAGE MEDIUM |
70 | 101978818 | FILM FORMING METHOD |
71 | 101979967 | DEVELOPING METHOD, DEVELOPING APPARATUS AND STORAGE MEDIUM |
72 | 101980446 | SUBSTRATE PROCESSING APPARATUS |
73 | 101980508 | COATING AND DEVELOPING APPARATUS, COATING AND DEVELOPING METHOD, AND STORAGE MEDIUM |
74 | 101981361 | PLASMA PROCESSING APPARATUS AND HIGH FREQUENCY GENERATOR |
75 | 101982366 | ETCHING METHOD AND DEVICE |
76 | 101984327 | COATING FILM FORMING APPARATUS |
77 | 101986892 | FUNCTIONAL LIQUID EJECTION APPARATUS AND FUNCTIONAL LIQUID EJECTION POSITION CORRECTING METHOD |
78 | 101986894 | DROPLET EJECTION APPARATUS AND DROPLET EJECTION CONDITION CORRECTION METHOD |
79 | 101987524 | SUBSTRATE LIQUID PROCESSING APPARATUS, SUBSTRATE LIQUID PROCESSING METHOD, AND COMPUTER-READABLE STORAGE MEDIUM HAVING SUBSTRATE LIQUID PROCESSING PROGRAM STORED THEREIN |
80 | 101987582 | SUBSTRATE PROCESSING APPARATUS AND SUBSTRATE PROCESSING METHOD |
81 | 101988090 | RAW MATERIAL GAS SUPPLY APPARATUS, RAW MATERIAL GAS SUPPLY METHOD AND STORAGE MEDIUM |
82 | 101988193 | METHOD FOR CHEMICAL POLISHING AND PLANARIZATION |
83 | 101989141 | FILM FORMING APPARATUS, CLEANING METHOD FOR FILM FORMING APPARATUS AND RECORDING MEDIUM |
84 | 101989216 | SUBSTRATE PROCESSING APPARATUS AND SUBSTRATE PROCESSING METHOD |
85 | 101989227 | METHOD OF FORMING INSULATING FILM |
86 | 101989324 | FOCUS RING AND SUBSTRATE PROCESSING APPARATUS HAVING SAME |
87 | 101989366 | SUBSTRATE PROCESSING EQUIPMENT |
88 | 101989629 | SWITCHABLE NEUTRAL BEAM SOURCE |
89 | 101989657 | SUBSTRATE PROCESSING APPARATUS AND SUBSTRATE PROCESSING METHOD |
90 | 101989707 | NEGATIVE TONE DEVELOPER COMPATIBLE PHOTORESIST COMPOSITION AND METHODS OF USE |
91 | 101990161 | FLUID PROCESSING DEVICE |
92 | 101990653 | CONTROL SYSTEM OF TRANSFER APPARATUS AND ADJUSTING METHOD OF ACCESS POSITION OF TRANSFER APPARATUS |
93 | 101990667 | FILM FORMATION DEVICE |
94 | 101991477 | MONOLAYER FILM MEDIATED PRECISION FILM DEPOSITION |
95 | 101991550 | FILM DEPOSITION METHOD OF SILICON-CONTAINING FILM |
96 | 101991574 | FILM FORMING APPARATUS AND GAS INJECTION MEMBER USER THEREFOR |
97 | 101993019 | PRETREATMENT METHOD, GRAPHENE FORMING METHOD AND GRAPHENE FABRICATION APPARATUS |
98 | 101993041 | PLASMA PROCESSING APPARATUS |
99 | 101993880 | PLASMA-TREATMENT APPARATUS |
100 | 101993975 | METHOD FOR SETTING MOUNTING POSITION OF TARGET SUBSTRATE AND FILM FORMING SYSTEM |
101 | 101994164 | SEALING FILM FORMING METHOD |
102 | 101994514 | SUBSTRATE PROCESSING APPARATUS |
103 | 101994874 | DRYING APPARATUS AND DRYING METHOD |
104 | 101995449 | SUBSTRATE PROCESSING APPARATUS AND SUBSTRATE PROCESSING METHOD |
105 | 101996719 | METHOD FOR DEPOSITING A PLANARIZATION LAYER USING POLYMERIZATION CHEMICAL VAPOR DEPOSITION |
106 | 101996772 | WAFER INSPECTION DEVICE AND MAINTENANCE METHOD FOR SAME |
107 | 101996986 | PLASMA TREATMENT DEVICE |
108 | 101997330 | PLASMA PROCESSING APPARATUS AND OPERATION METHOD OF THE SAME |
109 | 101997823 | PLASMA PROCESSING APPARATUS |
110 | 101997880 | SUBSTRATE PROCESSING APPARATUS, COATING AND DEVELOPING APPARATUS AND SUBSTRATE PROCESSING METHOD |
111 | 101997932 | SUBSTRATE PROCESSING APPARATUS |
112 | 101998520 | PLASMA PROCESSING APPARATUS AND PLASMA GENERATING UNIT |
113 | 101998894 | LIQUID SUPPLYING APPARATUS |
114 | 101998921 | HEAT TREATMENT SYSTEM, HEAT TREATMENT METHOD, AND PROGRAM |
115 | 101998943 | POWER MODULATION FOR ETCHING HIGH ASPECT RATIO FEATURES |
116 | 102000318 | PLASMA TREATMENT METHOD AND PLASMA TREATMENT DEVICE |
117 | 102000355 | PLASMA PROCESSING APPARATUS |
118 | 102000363 | PLASMA PROCESSING APPARATUS AND SHOWER HEAD |
119 | 102000797 | PLASMA PROCESSING APPARATUS AND METHOD FOR ADJUSTING PLASMA DISTRIBUTION |
120 | 102000802 | TEMPERATURE CONTROL SYSTEM, SEMICONDUCTOR MANUFACTURING DEVICE, AND TEMPERATURE CONTROL METHOD |
121 | 102000841 | HEAT TRANSFER MEDIUM SUPPLY SYSTEM AND SUBSTRATE PROCESSING APPARATUS |
122 | 102000852 | STAGE AND SUBSTRATE PROCESSING DEVICE |
123 | 102001351 | INTERFACE APPARATUS, INTERFACE UNIT, PROBE APPARATUS, AND CONNECTION METHOD |
124 | 102001708 | OPERATION LIMITING DEVICE, OPERATION LIMITING METHOD, AND RECORDING MEDIUM |
125 | 102002210 | METHOD FOR CLEANING SUBSTRATE TRANSFER MECHANISM AND SUBSTRATE PROCESSING SYSTEM |
126 | 102002215 | SUBSTRATE PROCESSING APPARATUS, JIG FOR MAINTENANCE, MAINTENANCE METHOD OF SUBSTRATE PROCESSING APPARATUS, AND STORAGE MEDIUM |
127 | 102002216 | SUBSTRATE LIFTING MECHANISM, SUBSTRATE MOUNTING TABLE, AND SUBSTRATE PROCESSING APPARATUS |
128 | 102002669 | METHOD OF DETOXIFYING EXHAUST PIPE AND FILM FORMING APPARATUS |
129 | 102003058 | METHOD FOR PROCESSING BASE BODY TO BE PROCESSED |
130 | 102003108 | SUBSTRATE PROCESSING APPARATUS |
131 | 102003585 | SUBSTRATE HOLDER AND SUBSTRATE PROCESSING APPARATUS |
132 | 102003591 | METHOD AND APPARATUS FOR SELECTIVE FILM DEPOSITION USING A CYCLIC TREATMENT |
133 | 102004037 | MICROWAVE PLASMA PROCESSING APPARATUS AND MICROWAVE PLASMA PROCESSING METHOD |
134 | 102004046 | METHOD OF FORMING TITANIUM OXIDE FILM AND METHOD OF FORMING HARD MASK |
135 | 102004556 | BUBBLE REMOVAL METHOD, BUBBLE REMOVAL APPARATUS, DEAERATION APPARATUS AND COMPUTER-READABLE RECORDING MEDIUM |
136 | 102006059 | COVER PLATE FOR DEFECT CONTROL IN SPIN COATING PROCESS |
137 | 102006504 | ASSIST EXPOSURE APPARATUS |
138 | 102006519 | PLASMA PROCESSING METHOD AND PLASMA PROCESSING APPARATUS |
139 | 102006523 | METHOD FOR CRYSTALLIZING GROUP IV SEMICONDUCTOR, AND FILM FORMING APPARATUS |
140 | 102007041 | SEPARATION APPARATUS, SEPARATION SYSTEM AND SEPARATION METHOD |
141 | 102007042 | DELAMINATION DEVICE |
142 | 102007043 | SUBSTRATE PROCESSING APPARATUS AND SUBSTRATE PROCESSING METHOD |
143 | 102007059 | ANTENNA FOR PLASMA GENERATION, PLASMA PROCESSING DEVICE AND PLASMA PROCESSING METHOD |
144 | 102008475 | METHOD FOR FORMING CU WIRING AND METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE |
145 | 102009052 | COATING FILM FORMING APPARATUS |
146 | 102009078 | FILM FORMING METHOD AND METHOD OF MANUFACTURING THIN FILM TRANSISTOR |
147 | 102009083 | SUBSTRATE PROCESSING APPARATUS |
148 | 102009369 | PLASMA PROCESSING APPARATUS |
149 | 102009372 | PLATING PROCESS DEVICE, PLATING PROCESS METHOD, AND STORAGE MEDIUM |
150 | 102009528 | SUBSTRATE PROCESSING APPARATUS, SUBSTRATE PROCESSING METHOD AND NON-TRANSITORY STORAGE MEDIUM |
151 | 102009541 | PLASMA PROCESSING DEVICE AND HIGH-FREQUENCY GENERATOR |
152 | 102009917 | SUBSTRATE LIQUID PROCESSING APPARATUS |
153 | 102009923 | PROCESSING METHOD OF SILICON NITRIDE FILM AND FORMING METHOD OF SILICON NITRIDE FILM |
154 | 102010095 | PEELING DEVICE, PEELING SYSTEM, PEELING METHOD, AND COMPUTER RECORDING MEDIUM |
155 | 102010122 | FILM DEPOSITION APPARATUS AND FILM DEPOSITION METHOD OF SILICON-CONTAINING FILM |
156 | 102010633 | SUBSTRATE PROCESSING METHOD AND SUBSTRATE PROCESSING APPARATUS |
157 | 102011519 | NOZZLE CLEANING APPARATUS, COATING APPARATUS, NOZZLE CLEANING METHOD, COATING METHOD, AND COMPUTER STORAGE MEDIUM |
158 | 102011520 | COATING APPARATUS AND COATING METHOD |
159 | 102011522 | PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD |
160 | 102011527 | DEVELOPING APPARATUS, DEVELOPING METHOD AND STORAGE MEDIUM |
161 | 102011538 | WIPING PAD, NOZZLE MAINTENANCE DEVICE USING PAD, AND COATING PROCESSING DEVICE |
162 | 102011563 | SUBSTRATE MOUNTING METHOD AND SUBSTRATE MOUNTING DEVICE |
163 | 102011567 | SUBSTRATE PROCESSING METHOD AND SUBSTRATE PROCESSING APPARATUS |
164 | 102012225 | PLASMA PROCESSING APPARATUS |
165 | 102012355 | SUBSTRATE PROCESSING METHOD, STORAGE MEIDUM STORING COMPUTER PROGRAM FOR IMPLEMENTING SUBSTRATE PROCESSING METHOD AND SUBSTRATE PROCESSING APPARATUS |
166 | 102012608 | WAFER INSPECTION METHOD AND WAFER INSPECTION DEVICE |
167 | 102013016 | VERTICAL HEAT TREATMENT APPARATUS |
168 | 102013029 | PLASMA ETCHING METHOD AND PLASMA ETCHING SYSTEM |
169 | 102013070 | PLASMA PROCESSING APPARATUS |
170 | 102013085 | WAFER INSPECTION DEVICE AND WAFER INSPECTION METHOD |
171 | 102013484 | HEAT TREATMENT APPARATUS, HEAT TREATMENT METHOD, AND PROGRAM |
172 | 102015679 | TEMPERATURE CONTROL METHOD, CONTROL DEVICE, AND PLASMA TREATMENT DEVICE |
173 | 102015693 | VERTICAL HEAT TREATMENT APPARATUS |
174 | 102015697 | SUBSTRATE PROCESSING APPARATUS |
175 | 102015698 | PLASMA FILM-FORMING APPARATUS AND SUBSTRATE PEDESTAL |
176 | 102015875 | ETCHING METHOD AND ETCHING APPARATUS |
177 | 102015876 | PLASMA PROCESSING METHOD AND PLASMA PROCESSING DEVICE |
178 | 102016769 | FILM FORMING METHOD, COMPUTER-READABLE RECORDING MEDIUM AND FILM FORMING APPARATUS |
179 | 102016773 | METHOD OF MANUFACTURING A SEMICONDUCTOR DEVICE |
180 | 102016789 | SUPPORT APPARATUS FOR PLASMA ADJUSTMENT, METHOD FOR ADJUSTING PLASMA, AND STORAGE MEDIUM |
181 | 102017935 | FILM FORMING METHOD, FILM FORMING APPARATUS, AND STORAGE MEDIUM |
182 | 102017937 | FILM FORMING APPARATUS, FILM FORMING METHOD, AND STORAGE MEDIUM |
183 | 102017944 | MANUFACTURING METHOD OF NICKEL WIRING |
184 | 102017962 | SHOWER HEAD AND DEPOSITION SYSTEM |
185 | 102018432 | FILM FORMING METHOD |
186 | 102019524 | PROCESSING LIQUID SUPPLY DEVICE, PROCESSING LIQUID SUPPLY METHOD AND STORAGE MEDIUM |
187 | 102019573 | SUBSTRATE PLACING TABLE |
188 | 102020704 | FILM FORMING APPARATUS |
189 | 102021168 | FILM FORMING METHOD AND FILM FORMING APPARATUS |
190 | 102021169 | SUBSTRATE PROCESSING APPARATUS |
191 | 102021171 | FILM FORMING APPARATUS |
192 | 102021570 | PLASMA PROCESSING APPARATUS AND HEATER TEMPERATURE CONTROL METHOD |
193 | 102022153 | SUBSTRATE PROCESSING APPARATUS AND SUBSTRATE PROCESSING METHOD |
194 | 102022158 | SELF-ALIGNED SPACER FORMATION |
195 | 102022762 | PLASMA PROCESSING METHOD |
196 | 102022764 | LIQUID DROPLET EJECTION APPARATUS AND EJECTION INSPECTION METHOD |
197 | 102023434 | FILM FORMING METHOD, FILM FORMING SYSTEM AND SURFACE PROCESSING METHOD |
198 | 102023784 | METHOD OF ETCHING SILICON NITRIDE FILMS |
199 | 102023817 | REDUCED-PRESSURE DRYING APPARATUS |
200 | 102023828 | TREATMENT DEVICE AND TREATMENT METHOD, AND GAS CLUSTER GENERATION DEVICE AND GENERATION METHOD |
201 | 102024386 | SUBSTRATE HOLDING APPARATUS AND SUBSTRATE HOLDING METHOD |
202 | 102024973 | PLASMA PROCESSING APPARATUS AND HIGH FREQUENCY GENERATOR |
203 | 102024983 | FILM FORMING METHOD |
204 | 102025457 | UPPER ELECTRODE AND PLASMA PROCESSING APPARATUS |
205 | 102025945 | APPARATUS FOR PREVENTING LOOSENESS OF BOLT, ATTACHING METHOD AND ATTACHING JIG THEREFOR, FLUID CONTROL DEVICE AND SUBSTRATE PROCESSING APPARATUS |
206 | 102025981 | METHOD FOR BOTTOM-UP FORMATION OF A FILM IN A RECESSED FEATURE |
207 | 102027675 | PLASMA PROCESSING APPARATUS |
208 | 102027687 | HIGH FREQUENCY GENERATOR AND PLASMA PROCESSING APPARATUS |
209 | 102028237 | SUBSTRATE PROCESSING APPARATUS |
210 | 102029538 | FILM FORMING APPARATUS AND FILM FORMING MEHTOD |
211 | 102029578 | PLASMA PROCESSING APPARATUS AND CONTROL METHOD |
212 | 102029579 | PLASMA PROCESSING APPARATUS AND CONTROL METHOD |
213 | 102030214 | EXHAUST SYSTEM |
214 | 102030223 | FILM FORMING APPARATUS, METHOD OF FORMING LOW-PERMITTIVITY FILM, SiCO FILM, AND DAMASCENE INTERCONNECT STRUCTURE |
215 | 102030232 | SUBSTRATE PROCESSING METHOD AND SUBSTRATE PROCESSING APPARATUS |
216 | 102030882 | FILM-FORMING PROCESSING APPARATUS, FILM-FORMING METHOD, AND STORAGE MEDIUM |
217 | 102030893 | SUBSTRATE PROCESSING SYSTEM, SUBSTRATE PROCESSING METHOD, AND HOLE INJECTION LAYER FORMING APPARATUS |
218 | 102030945 | LIQUID TREATMENT DEVICE AND LIQUID TREATMENT METHOD |
219 | 102031198 | PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD |
220 | 102031405 | SUBSTRATE PROCESSING APPARATUS |
221 | 102032617 | SUBSTRATE PROCESSING APPARATUS AND HEAT SHIELD PLATE |
222 | 102033120 | PLASMA-TREATMENT METHOD |
223 | 102033180 | PLASMA PROCESSING APPARATUS |
224 | 102033807 | SEPARATION CONTROL METHOD, AND CONTROL DEVICE FOR PLASMA PROCESSING DEVICE |
225 | 102033810 | SYSTEM FOR MONITORING FAILURE OF SUBSTRATE PROCESSING APPARATUS, AND METHOD FOR MONITORING FAILURE OF SUBSTRATE PROCESSING APPARATUS |
226 | 102033826 | PLASMA ETCHING METHOD |
227 | 102033873 | PLASMA PROCESSING APPARATUS |
228 | 102033975 | PLASMA PROCESSING METHOD, AND PLASMA PROCESSING DEVICE |
229 | 102033979 | ETCHING METHOD AND ETCHING APPARATUS |
230 | 102034344 | SUBSTRATE PROCESSING SYSTEM, SUBSTRATE TRANSFER METHOD AND COMPUTER STORAGE MEDIUM |
231 | 102034556 | PLASMA PROCESSING METHOD |
232 | 102035890 | ETCHING PROCESSING METHOD |
233 | 102036462 | FILM FORMING APPARATUS |
234 | 102036944 | METHOD OF CONTROLLING ADHERENCE OF MICROPARTICLES TO SUBSTRATE TO BE PROCESSED, AND PROCESSING APPARATUS |
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