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美国军方再次关注本课题组工作,是有关拓扑绝缘体微波响应的研究:
我们的论文链接如下:
http://www.opticsinfobase.org/ome/abstract.cfm?URI=ome-4-4-587
美国军方将Topological insulator列为先进材料:
他们认为,虽然拓扑绝缘体被认为下一代电子器件的理想材料,但它还将引起光子学领域的重要改变。
Topological insulator―a novel optical and microwave-absorbing material
For the first time, researchers in China experimen-tally demonstrated that
TI may be a novel microwave-absorbing material.
Besides their potential applications in next-generation electronic devices, topological
insulators may also give rise to significant change in photonics.
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