博文
Flow stress and Young's modulus in nanoindentation (2008)
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Zengsheng Ma, Shiguo Long, Yong Pan, Yichun Zhou
Nanoindentation tests in Ni thin films with 3000 nm thickness were performed under the maximum load ranging from 1000 to 9000 mN to investigate the dependence of the Flow stress and Young’s modulus upon the indentation scale under zero and 10% tensile strain. The results show that, the Flow stress and Young’s modulus all display the indentation depth dependence. Furthermore, an analytical relationship between the Young’s modulus E and hardness H for Ni thin films is established based on the conventional depth-sensing indentation method of Oliver and Pharr.
ICHMM2008, 195-199, (ISTP)
https://blog.sciencenet.cn/blog-451819-545583.html
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